Investigation of Structural Properties of Titanium Thick Layers Produced by PVD Method under Heat Process

Titanium thin layers with the same deposition conditions were deposited on glass substrates at room temperature. Different annealing temperatures namely, 400 K, 500 K and 600 K with uniform 9 cm /sec oxygen 3 flow were used to produce titanium oxide layers. The nano-structure of layers were studied using AFM and XRD methods. Optical Reflectance were studied by spectrophotometer method. Correlation between nano-structures and optical reflectance versus annealing temperature and penetrating oxygen were Annealing temperature and getting property of Titanium atoms play an important role on structural properties and Reflectance of layers.